光刻机掩模台宏动定位系统的控制器设计

Controller Design of the Macro-motion Positioning System for Lithography Stencil Stage

为给步进扫描光刻机的设计研究提供理论指导,解决光刻机掩膜台宏动平台的控制问题,采用直线电机设计了高速、高精密步进扫描光刻机的掩模台模拟宏动定位系统,并建立了整个直线运动平台的数学模型。根据该系统的特点和模型,还设计了一种不完全微分PID+干扰观测器的控制方式。运用MATLAB软件进行仿真,结果表明,在具有相同的扰动下,仅采用普通PID控制,系统跟踪误差在±0.025 mm范围内变化,而采用该控制方式,系统跟踪误差在±0.015 mm的范围内变化,后者比前者具有更好的控制性能,因而可以使系统得到较好的抗干扰能力、跟踪性能和控制效果。

In order to provide theoretical steering for the design of stepping and scanning lithography and settle the controlling problem of the macro-motion table for lithography stencil stage, the macro-motion positioning system for lithography stencil stage was designed using a linear motor and the mathematic model of the whole linear motion stage was established. By the characteristics of the system and the model, a control method of uncompleted differential PID + disturbance observer was proposed. Under the same disturbance, the simulation results by MATLAB software indicate that the tracking error with common PID control method is within ±0.025 mm and the error adopting the above proposed method is only within ±0.015 mm, illustrating that the latter has a better control performance than the former. So it can effectively restrain outside disturbances and possesses the favorable tracking performance and control effect.