离子注镧对镍表面氧化膜生长机制及应力水平的影响

Influence of La Ion-implantation on Growing Mechanism and Stress Status of Oxide Film Formed on Nickel

对纯镍及其表面离子注镧样品在900℃空气中的恒温氧化规律进行了研究。采用扫描电子显微镜(SEM)和透射电子显微镜(TEM)对NiO膜的微观形貌和结构进行测试。采用激光拉曼(Raman)谱和X射线衍射仪(XRD)对两种样品表面氧化膜的应力状态进行测量。采用二次离子质谱(SIMS)对氧化膜内元素Ni、O和La的深度分布情况进行了测量。结果表明,离子注镧显著降低了镍的恒温氧化速率,细化了表面NiO膜的晶粒尺寸,同时,将氧化膜生长的生长机制由未注镧前Ni2+阳离子向外扩散转变为注镧后O2-阴离子向内扩散为主。X射线衍射和激光拉曼测量均反映出注镧引起的膜内应力降低效应,并且,结合氧化膜内应力深度分布的不均匀性及膜生长过程中存在的稀土元素效应对两种应力测量结果之间存在的偏差进行了细致分析。

Isothermal oxidation behavior of pure nickel and its lanthanum ion-implanted sample were studied at 900 ℃ in air.The surface morphology and microstructure of NiO films formed on both samples were examined by scanning electronic microscopy(SEM) and transmission electronic microscopy(TEM).Laser Raman spectrometer and X-ray diffraction spectrometer(XRD) were used to study the stress status in NiO films formed on La-free and La-implanted nickel.Secondary ion massive spectrum(SIMS) was used to examine Ni,O and L...