多晶硅表面绒面的制备及优化

Improvement of Texture on MC Wafer Surface

本论文依据多晶硅结构的特点,对多晶硅表面绒面的制备进行研究并优化制绒工艺。酸绒面的制备可以改善多晶硅表面减反射效果。在合适的反应条件下用酸腐蚀的方法可以在硅片上制备出减反射效果良好的绒面,并且工艺简单、成本低,适合于工业的实际生产和应用。连续生产过程中不断添加一定比例的腐蚀液会使多晶硅片在一个相当长的范围内达到稳定的制绒效果。并且通过控制腐蚀深度可以得到好的短路电流,进而增大电池的光电转换效率。

This article give a research on fabrication and improvement of surface texture to multicrystal(mc) silicon wafer depend on configuration of mc wafer. Fabrication acid texture can reduce reflectivity. It can make better texture on wafer surface with fit reaction condition, process simply and cost low. Produce and application can easily adapt to the process. It can reach stable texture effect in a long time if add certain proportion etch liquid during production. It can gain better Isc and increase Eff throug...