期刊文献+

不同沉积工艺参数对YF_3膜层应力的影响 被引量:3

Relationships between the stress of YF_3 film and the process parameters
下载PDF
导出
摘要 薄膜材料的选择及其膜层特性的研究,是光学薄膜技术的基础和前提。YF_3硬度较高,折射率较低,是优选的红外低折射率材料,但存在成膜后膜层的应力较大的缺陷.通过研究镀膜过程中基片的烘烤温度、辅助离子源能量以及成膜后的热处理条件对 YF_3膜层应力的影响,分析了 YF_3膜层的应力随所选定工艺参数的变化规律. To choose proper materials and study their properties is the base of coating.YF_3 is popular film materials with low refractive index because of its good rigidity and lower refractive index,but the film made of YF_3 has some shortages such as bad physical-chemical properties and unstable optical properties.In the research of this paper,single layer film is made of YF_3 by using ion- assisted resistance-heater deposition.The stress of the film is studied while changing the process temperature,the energy of ion beam and annealing temperature.The relationships between the stress and the process parameters are summarized.
出处 《红外与激光工程》 EI CSCD 北大核心 2006年第z2期179-184,共6页 Infrared and Laser Engineering
关键词 应力 红外 光学薄膜 薄膜材料 Stress Infrared Optical thin film Film materials
  • 相关文献

参考文献4

  • 1[1]QUESNEL E,BERGER M.Near UV to IR optical characterization of YF3 thin film deposited by evaporation and ion beam process[C]//Proc of SPIE,Developments in Optical Component Coatings,1996,2776:366-371.
  • 2[3]周鹏飞,高扬,陈桂莲.离子辅助镀膜技术及其应用[C]//全国光学薄膜学术会议论文集,1991:17-20.
  • 3[4]HU S M.Film edge-induced Stress in substrates[J].Appl Phys,1979,50(7):4661-4666.
  • 4李景镇 苏世学.光学手册[M].西安:陕西科学技术出版社,1985..

共引文献13

同被引文献10

引证文献3

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部