摘要
薄膜材料的选择及其膜层特性的研究,是光学薄膜技术的基础和前提。YF_3硬度较高,折射率较低,是优选的红外低折射率材料,但存在成膜后膜层的应力较大的缺陷.通过研究镀膜过程中基片的烘烤温度、辅助离子源能量以及成膜后的热处理条件对 YF_3膜层应力的影响,分析了 YF_3膜层的应力随所选定工艺参数的变化规律.
To choose proper materials and study their properties is the base of coating.YF_3 is popular film materials with low refractive index because of its good rigidity and lower refractive index,but the film made of YF_3 has some shortages such as bad physical-chemical properties and unstable optical properties.In the research of this paper,single layer film is made of YF_3 by using ion- assisted resistance-heater deposition.The stress of the film is studied while changing the process temperature,the energy of ion beam and annealing temperature.The relationships between the stress and the process parameters are summarized.
出处
《红外与激光工程》
EI
CSCD
北大核心
2006年第z2期179-184,共6页
Infrared and Laser Engineering
关键词
应力
红外
光学薄膜
薄膜材料
Stress
Infrared
Optical thin film
Film materials
