期刊文献+

二元光学器件激光直写技术的研究进展 被引量:7

Research Advances in Technology of Laser Direct Writing for Binary Optical Elements
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摘要 二元光学器件的激光直写技术可克服传统的半导体工艺 (掩模套刻法或多次沉积薄膜法 )所带来的加工环节多、对准精度难以控制、周期长、成本高等问题 ,可进一步提高二元光学器件的制作精度和衍射效率。分析了二元光学器件激光直写的基本原理 ,对已有的各种激光直写方法和最新研究成果进行了综述 。 The technology of laser direct writing for binary optical elements can overcome the disadvantages caused by the traditional semiconductor technologies, such as multiprocessing steps, difficulty in controlling the accuracy of alignment, long period, and high cost, etc. It can improve the manufacturing precision and diffraction efficiency of binary optical elements. The basic principle of laser direct writing for binary optical elements is analyzed in this paper, followed by overview of available laser direct writing methods and recent progress. Finally, the future development is forecasted.
出处 《半导体光电》 CAS CSCD 北大核心 2002年第3期159-162,共4页 Semiconductor Optoelectronics
基金 国家自然科学基金资助项目 (5 0 0 0 5 0 2 2 )
关键词 二元光学 激光直写 变灰度掩模法 binary optics laser direct writing gray scale mask method
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参考文献14

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共引文献22

同被引文献90

  • 1赵转萍,吕晓明,郑叔芳,张如鹏.运动目标六自由度单束激光跟踪测量方法研究[J].仪器仪表学报,2001,22(z2):35-36. 被引量:5
  • 2侯德胜,杜春雷,邱传凯,白临波.ISI-2802激光直写系统及其应用[J].光电工程,1997,24(S1):27-31. 被引量:6
  • 3张锦,冯伯儒,杜春雷,王永茹,周礼书,侯德胜,林大键.反应离子刻蚀工艺因素研究[J].光电工程,1997,24(S1):47-52. 被引量:22
  • 4陈芳,高宏军,刘忠范.热压印刻蚀技术[J].微纳电子技术,2004,41(10):1-9. 被引量:9
  • 5邹林儿,陈抱雪,陈林,袁一方,鄂书林,浜中广見,磯守.As_2S_8玻璃条形波导的光激励法制备技术研究[J].光学学报,2006,26(7):1043-1047. 被引量:17
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二级引证文献38

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