TiN及AlN薄膜的制备和光学性能研究

Preparation of TiN and AIN Thin Films and Their Optical Characteristics

研究了反应溅射法制备AlN、TiN薄膜的工艺过程 ,摸索了用于磁光盘介质层的AlN、TiN薄膜的最佳制备工艺 ,并研究了采用此工艺制备的AlN、TiN薄膜的光学性能。

A series of AlN and TiN thin films for MO disks are prepared by RF magnetron sputtering technique.Sputtering conditions of AlN and TiN films prepared by RF reactive sputtering is investigated.Furthermore, the optical characteristics of these films are discussed.