摘要
叙述了采用LPCVD系统淀积多晶硅薄膜的机理 ,分析了在淀积多晶硅薄膜过程中引起发雾的因素 ,指出了保持LPCVD系统的洁净能有效消除在淀积多晶硅薄膜过程中出现的发雾现象。
The mechanism of deposition polysilicon thin film in LPCVD system is described. The origin of the fogging during the process of deposition of polysilicon thin film is analyzed. A novel effective method to eleminate the fogging is proposed.
出处
《半导体光电》
CAS
CSCD
北大核心
2002年第6期421-423,共3页
Semiconductor Optoelectronics
