期刊文献+

一、二阶释放模型在表面微机械中的应用

Application of First-and-second Order Release-etch Modeling forSurface Micromachined Structures
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摘要 随着硅表面微机械技术的发展,使得许多微机械器件的制作成为可能。通过对一、二阶释放腐蚀模型进行深入研究,详细分析了一、二阶混合释放腐蚀模型在微机械中几种基本牺牲层腐蚀结构中的应用,并对分析结果进行仿真计算和分析。 Recent development of silicon micromachining technology has made possible the fabrication of many micromechanical devices. Through an in depth research on the first-and-second order sacrificial layer release-etch model, several fundamental micromachined structures are analyzed using the first-and-second order release-etch model. Simulation and analysis has been done on the results.
出处 《仪器仪表学报》 EI CAS CSCD 北大核心 2004年第z3期91-94,共4页 Chinese Journal of Scientific Instrument
基金 "863"国家高技术研究发展计划基金项目(2003AA404012)
关键词 硅表面微机械 牺牲层释放腐蚀 一、二阶合腐蚀模型 Silicon surface micromachining Sacrificial layer release-etch First-and-second order etch model
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参考文献5

  • 1[1]J. Monk. Controlled structure release for silicon surface micromachining. Ph. D. Dissertation,University of California at Berkeley, Department of Chemical Engineering, 1993.
  • 2[2]J Liu, Y-C Tai, J Lee, K-C Pong, Y Zohar, C-H Ho.In situ monitoring and universal modeling of sacrifical PSG etching using hydrofluoric acid. Proceedings of Micro Electro Mechanical Systems, IEEE, 1993: 71~76.
  • 3[3]D J Monk, D S Soane, R T Howe. Hydrofluoric acid etching of silicon dioxide sacrifical layers, part Ⅱ. Modeling. J of the Electrochemical Society, 1994, 141 (1):270~274.
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