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ZnO:LiCl/p-Si薄膜中的施主-受主发光

Donor-Acceptor Luminescence in ZnO:LiCl/p-Si Films
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摘要 用溶胶凝胶法(sol-gel technique)在p-Si上制备LiCl:ZnO薄膜.试样分别进行O2-600℃,O2-900℃热退火处理.在77~325K温度范围内作电流-温度(I-T)和深能级瞬态谱(DLTS)测量.DLTS测量获得的两种试样中存在一个稳定的深能级中心.(I-T)测量证实这个深能级中心是与ZnO的本征缺陷相关的.室温PL谱测量得到两种试样存在较强的深能级发光,而紫外发光较弱.由实验结果推测,试样主要的深能级发光过程是电子从双离化Zni**施主能级向单离化V'zn受主能级的跃迁.在O2气氛退火作用下深能级的发光强度增强.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第z1期171-174,共4页 半导体学报(英文版)
基金 国家自然科学基金资助项目(批准号:50472009,10474091和50532070)
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参考文献14

  • 1[1]Prisching D,Pecina A H.Temperature behaviour of ZnO varistors before and after post sintering heat treatment.Mater Lett,2000,43:295
  • 2[2]Alim M A,Li S T,Liu F,et al.Electrical barriers in the ZnO varistor grain boundaries.Phys Status Solidi A,2006,203(2):410
  • 3[3]Baptista J L,Mantas P Q.High temperature characterization of electrical barriers in ZnO varistors.Journal of Electroce-ramies,2000,4(1):215
  • 4[4]Look D C.Recent advances in ZnO materials and devices.Mater Sci Eng,2001,B80:383
  • 5[5]Liu Cihui,Duan Li,Lin Bixia,et al.The research of characteristics of ZnO:Al/p-Si contact.Chinese Journal of Lumi-uescence,2005,26(4):526(in Chinese)[刘磁辉,段理,林碧霞,等.ZnO:Al/p-Si接触特性的研究.发光学报,2005,26(4):526]
  • 6[6]Liu Cihui,Chen Yulin,Zhu Junjie,et al.Electrical properties of ZnO/Si heterostructure.Chin Phys Lett,2001,18(8):1108
  • 7[7]Potu(c)ek Z,Bryknar Z,Pt (c)áek P,et al.Luminescence of defects in Li-doped ZnO thin films.Phys Status Solidi C,2005,2(1):256
  • 8[8]Greutert F,Blattert G.Semicond electrical properties of grain boundaries in polycrystalline compound semiconductors.Sci Technol,1990,5:111
  • 9[9]Mahan G D.Intrinsic defects in ZnO varistors.J Appl Phys,1983,54(7):3825
  • 10[10]Lott K,Shinkarenko S,Kirsanova T,et al.Atomic absorption photometry of excess Zn in ZnO.Phys Status Solidi C,2005,2(3):1200

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