甲苯在不同背景气氛下的介质阻挡放电降解行为研究

Research on Toluene Removal Behavior by Dielectric Barrier Discharge Under Different Background Gases

采用线板式介质阻挡放电对甲苯进行降解,研究不同背景气氛(不同配比的N2/Ar和N2／O2)下甲苯的 降解行为．研究发现,当氮气中加入氩气时,随着N2／Ar中Ar含量的增加,甲苯的降解率迅速升高,而且所需 的电场强度大大降低．当背景气体为氩气(含微量氧)时,输入电压仅为4 kV,甲苯的降解率就可达98．1％．在 N2／Ar中甲苯一部分转化为CO和CO2,其他为一些副产物,如HCN,CH4,C2H6,C12H26等．在N2／O2气氛下,氧 的体积分数为2％左右时甲苯的降解效率最高,甲苯几乎完全被氧化为CO和CO2,副产物仅为O3．

A wire-plate dielectric barrier discharge was used to remove toluene, and the decomposition behavior of toluene under different background gases was investigated. It was found that toluene removal efficiency increased and the needed electric field strength decreased greatly with the increase of argon content in N2/Ar gas. When the background gas was argon (included a little oxygen), The toluene removal efficiency reached 98.1% at the applied voltage of 4 kV. Toluene was decomposed partially to CO and CO2, and some byproducts such as HCN, CH4, C2H6, C12H26 were produced in the N2/Ar gas. In N2/O2 gas, the highest toluene removal efficiency was achieved when the oxygen content was 2%. Almost all toluene was oxidized to CO and CO2, and ozone was the only byproduct.