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化学增幅抗蚀剂用光产酸剂——硫鎓盐的合成方法 被引量：2

Photoacid generator used in the chemical amplified photoresist——the method of synthesization of sulfonium salts
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摘要 介绍了国内外光致抗蚀剂的研究进展、化学增幅光致抗蚀剂用光产酸剂———硫鎓盐的主要合成方法,同时介绍了193nm光致抗蚀剂所使用的光产酸剂及其合成方法,指出合成193nm光致抗蚀剂用光产酸剂的重要性。 This paper introduces the latest development of the photoresist and the photoacid generator (PAG) used in the chemical amplified photoresist -the preparation of the sulfonium salts. Meantime, PAGs in the 193nm photoresist is discussed. It points out that it is very significant to prepare the PAGs used in the 193nm photoresist.
作者 王文君
机构地区 中国环境管理干部学院
出处 《中国环境管理干部学院学报》 CAS 2005年第2期55-58,共4页 Journal of Environmental Management College of China
关键词 光产酸剂 193nm 光致抗蚀剂 化学增幅 硫鎓盐 photoacid generator 193nm photoresist chemical amplification sulfonium salt
分类号 X63 [环境科学与工程]
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  • 2Nalamasu O, Houlihan F M, et al. 193 nm single layer resist strategies and resent results[J]. J Vac Sci Technol B, 1998,16(6): 3716.
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  • 4Hiroyuki Ishii, Hinji Usui, Atsuji Dould, et al. Design and lithographic performances of 193-specific photoacid generators[C]. In:Proc. SPIE , Advances in Resist Technology and Processing XVII , 2000,3999:1120-1129.
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  • 9Alan L Maycock, et al. Photochemical reactions of phenacyl- and benzylsulfonium salts[J ]. J Org Chem, 1970,35 (8) : 2532-2539.
  • 10Dennis N Kevill, Steven W Anderson. Essentially solvent-independent rates of solvolysis of the 1-adamantyl dimethylsulfonium ion, Implications regarding nucleeophilic assistance in solvolyses of tert-butyl derivatives and the NKL sulvent nucleophilicity scale[J]. J Am Chem Soc , 1986,108:1579-1585.

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中国环境管理干部学院学报
2005年 第2期

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