摘要
In this paper,the study of projection properties of two-level factorials in view of geometry is reported.The concept of uniformity pattern is defined.Based on this new concept,criteria of uniformity resolution and minimum projection uniformity are proposed for comparing two-level factorials.Relationship between minimum projection uniformity and other criteria such as minimum aberration,generalized minimum aberration and orthogonality is made explict.This close relationship raises the hope of improving the connection between uniform design theory and factorial design theory.Our results provide a justification of orthogonality,minimum aberration,and generalized minimum aberration from a natural geometrical interpretation.
In this paper,the study of projection properties of two-level factorials in view ofgeometry is reported.The concept of uniformity pattern is defined.Based on this new con-cept,criteria of uniformity resolution and minimum projection uniformity are proposed forcomparing two-level factorials.Relationship between minimum projection uniformity andother criteria such as minimum aberration,generalized minimum aberration and orthogo-nality is made explict.This close relationship raises the hope of improving the connectionbetween uniform design theory and factorial design theory.Our results provide a justifi-cation of orthogonality,minimum aberration,and generalized minimum aberration from anatural geometrical interpretation.
基金
partially supported by the Hong Kong RGC grant,RGC/HKBU 2044/02P
the National Natural Science Foundation of China(Grant No.10071029)
the Project-sponsored by SRF for ROCS(SEM)
the NSF of Hubei Province for the second author.
