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Design and fabrication of InP micro-ring resonant detectors

Design and fabrication of InP micro-ring resonant detectors
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摘要 The quantum efficiency and the transient response of the InP semiconductor micro-ring resonant detector are analyzed to get the optimum design parameters.Then the side coupling micro-ring resonant is fabricated using the InP semiconductor material based on the parameters.The micro-ring resonant cavity has the raius of 80 μm,waveguide width of 3 μm and the coupler gap of 1 μm.The test results show that the FSR is 0.75 nm,and the FWHM is 0.5 nm,which are consistent with the theoretical calculation results. The quantum efficiency and the transient response of the InP semiconductor micro-ring resonant detector are analyzed to get the optimum design parameters.Then the side coupling micro-ring resonant is fabricated using the InP semiconductor material based on the parameters.The micro-ring resonant cavity has the raius of 80 μm,waveguide width of 3 μm and the coupler gap of 1 μm.The test results show that the FSR is 0.75 nm,and the FWHM is 0.5 nm,which are consistent with the theoretical calculation results.
出处 《Optoelectronics Letters》 EI 2009年第1期6-10,共5页 光电子快报(英文版)
基金 supported by National "973 Program" of China(2003CB314901) the Program for New Century Excellent Talentsin University of China (NCET-05-0111) the National "111 Project"(B07005) the National Program for Changjiang Scholars and Innovative Research Team in University of China (No.IRT0609)
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