用芯片图形与数据带比较检查掩模缺陷

Using Die-to-database Comparison Inspection Defects Technology of Mask

为了零缺陷的突破,本文介绍芯片图形与数据带(Die-to-date base)比较检查掩模版缺陷的原理,系统组成和数据结果分析。

In order to ensure zero defects,this paper introduced die-to-database comparison inspection principle of mask plate defects,consists of system and data result analysis.