UV Emission of Excimer XeCl Excited in Dielectric Barrier Discharge by using Pulse Power Supply 被引量：2

UV Emission of Excimer XeCl Excited in Dielectric Barrier Discharge by using Pulse Power Supply

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摘要 A dielectric barrier discharge experimental setup, which is convenient to vary the gas parameters of the mixture of xenon and chlorine, has been established and used to generate UV emission (308 nm). The influences of the partial pressure of chlorine and the total gas pressure on the UV emission under different electric parameters of pulse power supply have been studied preliminarily. A dielectric barrier discharge experimental setup, which is convenient to vary the gas parameters of the mixture of xenon and chlorine, has been established and used to generate UV emission (308 nm). The influences of the partial pressure of chlorine and the total gas pressure on the UV emission under different electric parameters of pulse power supply have been studied preliminarily.

作者徐金州梁荣庆任兆杏

出处《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第5期933-940,共8页 等离子体科学和技术（英文版）

基金 Jiangsu Purification Egineering & Technology Research Center of Jiangsu Suzhou PurificationGroup Co., Ltd

分类号 O434.2 [机械工程—光学工程] O539 [理学—等离子体物理]

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