双光路成像干涉定心系统设计

Design of Centering System by Using Collimation and Interference with Two Channels

在光刻投影物镜镜片加工和装配时,为了满足磨边定心和装配定心阶段对镜片测量的量程、灵敏度和准确度不同的需求,本文提出了一种双光路准直成像复合干涉的定心方法,采用同一光路实现准直和干涉两种不同的测量方法,分别针对磨边定心和装配定心的测量需要.根据实际需要设计了测量系统的参量,根据该参量对系统的测量范围、灵敏度和准确度进行了理论分析.结果表明:该系统在准直测量阶段的测量范围从1μm到500μm,测量灵敏度最高为0.2%,测量准确度为1.02μm;在干涉测量阶段的测量范围从0.01μm到1.9μm,测量灵敏度最低为0.1%,测量准确度达到0.2μm,可以满足在磨边定心阶段大量程、低灵敏度、低准确度以及装配定心阶段小量程、高灵敏度、高准确度的定心要求.采用双光路成像干涉原理的定心系统满足了设计需求,可指导光刻投影物镜等高准确度物镜的生产和装调.

In order to meet different centering measurement demands when edging and assembling the projection lens,a centering system by using collimation and interference with two channels is proposed.The system use collimation and interference in the same optical configuration.Parameters of the measurement system are designed,and measurement range,sensitivity and the measurement accuracy are analyzed in theory.The results show that measurement range of the system by using collimation is from 1 μm to 500 μ m,the highest sensitivity is 0.2%,and accuracy reach 1.02 μm;the measurement range of the system by using interference is from 0.01 μm to 1.9 μ m,the lowest sensitivity is 0.1%,and accuracy reach 0.2 μm.The design can satisfy demands of a wide range,low sensitivity,low accruacy in centering-edging stage,and small range,high sensitivity,high accruacy in assembling stage.The centering system can meet the design requirements,and can guide the production and assembly of lithographic projection lens.