分析不同边长光学微腔内横模模场分布

Analysis of the Modes in an Equilateral Triangle Microcavity of different side length

本论文使用FullWAVE4.0软件中的二维FDTD法模拟了有效折射率为3.2,对边长为5μm和边长为3μm的等边三角形光学微腔模式分布状况。对腔内的横模模场进行分析,发现边长为5μm的等边三角形微腔和边长为3μm的等边三角形微腔在低阶模时,光线在三角形边界上几乎发生全反射,但随着模阶数的增大光线的透射逐渐增强,能量损失逐渐变大,在腔内很难形成稳定的模式分布,这说明这两种边长的等边三角形微腔是有利于基模工作。并比较两种边长的等边三角形光学微腔模场分布状况,分析了可能导致的几个原因。

In this paper,equilateral triangle resonators with the refractive index of 3.2 and for the side length of 5 um and 3 um are simulated by 2-D FDTD technique in Full WAVE 4.0 software and the fundamental mode field are analyzed.The result show that light occur nearly total reflection on the border if the fundamental mode exist in equilateral triangle resonators.However transmission on of light increase with the order of the mode,largen energy loss gradually,it is very difficult to form a stable mode of distribution.To compare two kinds of side length of the equilateral triangle optical microcavity mode field distribution,analysis may lead to several reasons.