摘要
针对微晶玻璃材料系统研究了加工时间、作用距离以及入射角度对去除函数的影响。实验及分析结果表明:加工时间及作用距离与去除效率呈线性关系;随着入射角的增大,理论与实际去除率偏差也随之增大,在入射角为0o～60o时,去除率偏差值变化范围为1.43%至3.38%,总体上仍小于5%的误差指标,满足非球面离子束超精密抛光的需求。
The effect of working time, working distance and incident angle on removal characteristics were investigated comprehensively in this paper. It indicates that the removal rate varied linearly with increasing working time and working distance. And as the incidence angle increasing from 0o to 60o, the deviation of removal rate was also increased from 1.43% to 3.38% gradually. All of them make the basic condition for polishing aspheric mirrors determinedly with IBF.
出处
《航天制造技术》
2013年第3期8-11,共4页
Aerospace Manufacturing Technology
关键词
去除特性
三轴离子束系统
归一化去除效率
removal characteristics
three-axis IBF system
normalized removal rate
