A Novel Empirical Model of I-V Characteristics for LDD MOSFET Including Substrate Current

包含衬底电流的LDD MOSFET输出I-V特性的经验模型分析(英文)

A compact model for LDD MOSFET is proposed,which involves the hyperbolic tangent function description and the physics of device with emphasis on the substrate current modeling.The simulation results demonstrate good agreement with measurement,and show that deep submicron LDD MOSFET has larger substrate current than submicron device does.The improved model costs low computation consumption,and is effective in manifestation of hot carrier effect and other effects in deep submicron devices,in turn is suitable for design and reliability analysis of scaling down devices.

采用双曲正切函数的经验描述方法和器件物理分析方法 ,建立了适用于亚微米、深亚微米的 L DD MOSFET输出 I- V特性解析模型 ,模型中重点考虑了衬底电流的作用 .模拟结果与实验有很好的一致性 .该解析模型计算简便 ,对小尺寸器件中的热载流子效应等能够提供较清晰的理论描述 。