期刊文献+

InP/GaAs键合热应力的有限元分析 被引量:3

Analysis of Thermal Stress in InP/GaAs Bonding by Finite Element Method
下载PDF
导出
摘要  用有限元方法结合ANSYS工具,研究了InP/GaAs键合在退火后的热应力分布图像。重点计算并详细讨论了对解键合有重要作用的界面上的剥离力和剪切力。最后分析了影响热应力大小的有关因素。数值分析结果与相关文献实验结果一致。 Thermal stress distribution in wafer bonding of InP/GaAs after annealing is investigated by combining finite element method(FEM) with the ANSYS program. Interficial peeling and shear stresses which play an important role in debonding are calculated and discussed in detail. Finally, the related factors influencing on thermal stress are analyzed. Numerical results agree with experimental ones presented by some references.
出处 《半导体光电》 CAS CSCD 北大核心 2004年第4期277-280,共4页 Semiconductor Optoelectronics
基金 国家自然科学基金重点项目(90201035) 国家自然科学基金重大研究计划项目 (90 1 0 40 0 3 )
关键词 键合 有限元方法 热应力 wafer bonding finite element method thermal stress
  • 相关文献

参考文献6

  • 1[1]Chen W T, Nelson C W. Thermal stress in bonded joints[J]. IBM J. Res. Dev. , 1979, 23.. 178-188.
  • 2[2]Suhir E. Stresses in bi-metal thermostatats[J]. ASME J. Appl. Mech., 1986, 53(3): 595-600.
  • 3[3]Kuo A Y. Thermal stresses at the edge of a bimetallic thermostat[J]. ASME J. Appl. Mech. , 1989, 56: 585589.
  • 4[4]Cherepanov G P. On the theory of thermal stresses in a thin film on a ceramic substrate[J]. J. Appl. Phys. ,1994, 75(2): 844--849.
  • 5[5]Ogawa S, Imada M, Noda S. Analysis of thermal stress in wafer bonding of dissimilar materials for the introduction of an InP-based light emitter into a GaAsbased three-dimensional photonic crystal [ J ]. Appl. Phys. Lett., 2003, 82(20): 3 406-3 408.
  • 6[6]Grupen-Shemansky M E, Hawkins G W, Liaw H M.Stress in GaAs bonded to Si[A]. Proceedings of 1st International Symposium on Semiconductor Wafer Bonding.. Science, Technological, and Applications [C]. Pennington, NJ: The Electrochemical Society,1992, 92-7: 132.

同被引文献17

  • 1王琦,黄辉,王兴妍,陈斌,黄永清,任晓敏.低温晶片键合技术及在通信光电子器件中的应用[J].半导体技术,2004,29(10):3-7. 被引量:3
  • 2陈斌,王兴妍,黄辉,黄永清,任晓敏.Ⅲ-Ⅴ族半导体晶片键合热应力分析[J].半导体光电,2005,26(5):421-424. 被引量:4
  • 3刘志强,王良臣,于丽娟,郭金霞,伊晓燕,马龙,王立彬,陈宇.InP/Si键合界面热应力分析[J].半导体光电,2006,27(4):429-433. 被引量:2
  • 4TONG Q Y, GOSELE U. Semiconductor wafer bonding science and technology [M]. New York: Wiley-Interscience, 1999.8-13.
  • 5WADA H, KAMIJOH T. Effect of heat treatment on bonding properties in InP-to-Si direct wafer bonding[J]. Jpn J Appl phys, Part 1, 1994, 33(9A) : 4878-4879.
  • 6LEMONS R A, QUATE C F. Acoustic microscopyscanning version[J]. Appl Phys Lett, 1974,24(2): 163-165.
  • 7TSAI C S, WANG S K, LEE C C. Visualization of solid material joints using a transmission-type scanning acoustic microscope[J]. Appl Phys Lett, 1997,31 (5): 317-320.
  • 8OKUNO Y, UOMI K, AOKI M, et al. Direct wafer bonding of Ⅲ- Ⅴ compound semiconductor for free-material and freeorientation integration[J]. IEEE Journal of Quantum Electronics, 1997,33(6):959-969.
  • 9Ogawa S,Imada M,Noda S. Analysis of thermal stress in wafer bonding of dissimilar materials for the introduction of an InP-based light emitter into a GaAsbased three-dimensional photonic crystal [J]. Appl.Phys. Lett. ,2003,82(20) :3 406-3 408.
  • 10Pasquariello D, Hjort K. Plasma assisted InP to Si low temperature wafer bonding[J]. IEEE J. Select. Topics in Quantum Electron. ,2002,8( 1 ) : 118-131.

引证文献3

二级引证文献9

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部