摘要
The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti:sapphire laser (λp=790 nm).The refractive index modifications with diameters ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2×1013 W/cm2.The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.
The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti:sapphire laser (λp=790 nm).The refractive index modifications with diameters ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2×1013 W/cm2.The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.
出处
《中国有色金属学会会刊:英文版》
CSCD
2012年第S3期808-812,共5页
Transactions of Nonferrous Metals Society of China
基金
Project(2010-0008-277)supported by NCRC(National Core Research Center)Program through the National Research Foundation of Korea funded by the Ministry of Education,Science and Technology