自组装功能膜诱导沉积TiO_2薄膜的研究

Study on Deposition TiO_2 Thin Film Induced by Self-assembled Monolayers

将自组装分子膜层(SAMs)技术与液相沉积技术(LPD)相结合,以氟钛酸氨((NH4)2TiF6)和硼酸(H3BO3)为原料配制反应前驱液,在镀有十八烷基三氯硅烷(OTS)自组装分子膜层的玻璃基底表面制备出与基底结合紧密、结构致密均一、厚度可控的纳米TiO2晶态薄膜。采用XRD、SEM和AFM等测试手段对薄膜的物相组成、显微结构和表面形貌进行了表征。结果表明:OTS-SAMs功能化基底对TiO2薄膜的沉积具有明显的诱导作用,当前驱液的(NH4)2TiF6浓度为0.05 mol.L-1,与H3BO3的摩尔比为3∶1,pH=3.0时,在50℃下沉积10 h后,无需退火,就可得到结晶良好的纯锐钛矿相TiO2晶态薄膜。

TiO2 crystalline thin films were fabricated by self-assembled monolayers(SAMs) technique and liquid phase deposition(LPD) method using ammonium hexafluorotitanate((NH4)2TiF6) and boric acid(H3BO3) as raw materials.Homogeneous and well-bonded thin films were successfully deposited on the glass substrates which were modified by octadecyltrichlorosilane(OTS) self-assembled monolayers.The crystalline phase composition,microstructures and morphologies were characterized by XRD,SEM and AFM,respectively.The results indicated that the deposition process of TiO2 thin films was induced by self-assembled monolayers,and crystalline TiO2 thin films with an anatase phase can be successfully prepared under the condition of c(AHFT)=0.05 mol·L-1,c(H3BO3):c(AHFT)=3∶1,pH=3.0,T=50 °C,and t=10 h without annealing.