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MOCVD生长AlGaInP/InGaAsP大功率808nm无铝量子阱激光器

MOCVD Growth of AlGaInP/InGaAsP 808 nm Al-Free Quantum Well Laser Diode
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摘要 设计制作非对称宽波导结构无铝量子阱激光器,可降低内部损耗,实现低阈值电流、高转换效率的目的,同时也增加了最大输出功率。采用金属有机气相化学沉积(MOCVD)进行外延生长,制作了100μm条宽,1500μm腔长的808nm激光器器件,镀膜后阈值电流230.5mA,斜率效率1.31W/A。连续电流条件下,得到最大输出功率超过8W,并且计算得到内吸收系数为1.7cm-1。 The Al-free quantum well laser diode(LD)with asymmetric broad-waveguide structure was designed,in order to improve the LDs' characteristics.The structure was grown by metal organic chemical vapor deposition(MOCVD).For the device with 100 μm wide stripe and 1 500 μm long cavity,under continuous wave(CW)operation condition,the typical threshold current is 230.5 mA,the slope efficiency is 1.31 W/A,the maximum output power reaches higher than 8 W,and the internal absorption value decreases to 1.7 cm-1.
出处 《半导体技术》 CAS CSCD 北大核心 2008年第S1期65-67,共3页 Semiconductor Technology
关键词 量子阱激光器 非对称结构 金属有机化学气相外延 quantum well laser diode asymmetric broad-waveguide structure metal organic chemical vapor deposition(MOCVD)
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