测定表面织构薄膜厚度的X射线双级衍射法

The Double-Order X-Ray Diffraction Method for Determining the Thickness of Thin Film with Texture

本文利用薄膜或膜下基体晶面的一、二级X射线衍射消除织构因素。提出两种测定织构薄膜厚度的方法:薄膜线条法和基体线条法。推导出膜厚测定表达式d=sinθ_1/μLln(1/K)。给出其测量相对误差的极小值条件K=1/e,并实验验证了该方法适用。

The first and second order diffractions of thin film or matrix Crystal plane have been used to eliminate the texture factor. Two methods to determine the thin film thickness have been proposed:thin film and matrix X-ray diffraction methods. Deduced formula for defermining thin film thickness is d=sinθ1/μLln(1/K) and the minimum value of its measure- ment relative error K=1/e has been given. Experiment has proved it to be available.