摘要
采用射频等离子体增强磁控溅射同步沉积，在金属表面制备了Ａｌ２Ｏ３ 膜．实验表明，采用本方法在工艺上是可行的，膜与基材结合性能好。
Al2O3 films have the good properties of resistance to high temperature, wear and corrosion. They have been achieved on the substrates by the RF plasma enhanced magnetron sputtering deposition. The experiment shows this technological process is practicable.
出处
《大连理工大学学报》
EI
CAS
CSCD
北大核心
1993年第6期644-646,650,共4页
Journal of Dalian University of Technology
基金
辽宁省科委资助项目
关键词
氧化铝
薄膜
磁控溅射沉积
high frequency discharge/Al2O3 films
RF plasma
plasma enhanced magnetron sputtering deposition
