硅表面内铵盐型碳菁膜及光电特性

Inner ammonium salt carbocyanine film on silicon surface and its photoelectric properties

通过硅氧碳键（ Ｓｉ－ Ｏ－ Ｃ） 将两个内铵盐型碳菁染料在硅表面化学成膜，利用表面增强喇曼光谱（ Ｓ Ｅ Ｒ Ｓ） 和 Ｘ 射线光电子能谱（ Ｘ Ｐ Ｓ） 确证其结构，并测定了键合染料膜硅片的光谱响应和表面光电压。结果表明染料可使硅敏化。

Two inner salt carbocyanine dyes are chemically filmed on the Si surface through Si-O-C bond.The structures are characterized by SERS and XPS.And the spectral response and surface photovoltage spectrum are measured.These results show that the Si wafer can be sensitized by dyes,and the filmed Si wafers exhibit photovoltage effect.