烟草蚀纹病毒弱株系的研究

Induced Mild Strains of Tobacco Etch Virus

1991～1995年利用钴60照射和亚硝酸处理进行了烟草蚀纹病毒（TEV）弱株系的选择及防病效果试验。结果表明，钴60照射病毒溶液能产生弱株突变体的适宜剂量是1．29C／kg和2．58C／kg，亚硝酸处理的适宜浓度和时间是1mol／L，30min～50min。以选择效果明显的弱株有R4和H38，其室内交互保护试验的效果最高值分别是85．8％和47．4％，田间防病效果分别为81．6％和40．3％。两个弱株免疫后接种强株，其烟株体内病毒含量均低于强株对照。试验还表明，亚硝酸处理较钻60能产生较多的弱株突变体。

Mild strains of tobacco etch were studied. Suitable dosage of C treatment was1. 29C/kg and 2. 58C/kg for TEV produclng mutant. Sultable denslty of HNO2, treatment is 1 mol. L-1 and 30~50min. R4 strain and H,, strain were better. Protect effectof R4 and H38 were 85. 8 % in the greenhouse and 47. 4 % respectively. The effect of R4 tocontrol tobacco etch virus were 81. 6% in the field and whereas H,, were 40. 3 %. Viruscontent of immune plant was lower than chek. The results showed that HNO2, treatmentcan produce more mutant than C60.