亚微米i线投影光刻物镜的光学设计与研制

Optical Design and Manufacture of i Line Projection Lens for Submicrometer Photolithography

叙述亚微米投影光刻物镜光学设计要点：光刻分辨力Ｒ与波长λ、数值孔径ＮＡ的关系；光学系统双远心的构成方法；光刻物镜的象差校正优化设计中的需控目标值等问题。介绍一个亚微米ｉ线投影光刻物镜的设计结果、光学制造公差和质量控制方法，以及其主要性能测试结果。

Some main points such as the relations of the resolution R , wavelength λ and numeric aperture NA ,the constituting method of double telecentric configuration in the optical system,and some problems of object values which are needed to be controlled for the aberration correction in the optimization design of the projection objective for the submicrometer photolithography are described.A design example of projection objective for submicrometer i line photolithography,the optical fabrication errors and the quality control method,and the testing results of its main properties are introduced.