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STRUCTURE AND PROPERTIES OF Cu-Co MULTILAYER FILMS PRODUCED BY ELECTRODEPOSITION

STRUCTURE AND PROPERTIES OF Cu-Co MULTILAYER FILMS PRODUCED BY ELECTRODEPOSITION
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摘要 Multilayer Cu-Co film has been produced from a single bath by the method of pulse electrodeposition. Its structure and some magnetic properties were analysed by TEM,AES, XRD and VSM. The results indicated that the film was layed structure, consisted of alternating pure copper and copper-cobalt alloy layers. The results have shown the possibility of producing multilayer films with perpendicular magnetic anisotropy byelectrodeposition. Multilayer Cu-Co film has been produced from a single bath by the method of pulse electrodeposition. Its structure and some magnetic properties were analysed by TEM,AES, XRD and VSM. The results indicated that the film was layed structure, consisted of alternating pure copper and copper-cobalt alloy layers. The results have shown the possibility of producing multilayer films with perpendicular magnetic anisotropy byelectrodeposition.
出处 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 1997年第2期115-119,共5页 金属学报(英文版)
关键词 ELECTRODEPOSITION copper-cobalt MULTILAYER electrodeposition, copper-cobalt, multilayer
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