EPR Study of Radiation Damage in Si after High Energy Implantation of Ar Ions
EPR Study of Radiation Damage in Si after High Energy Implantation of Ar Ions
摘要
EPRStudyofRadiationDamageinSiafterHighEnergyImplantationofArIons¥LiuChanglong;HouMingdong;WangZhiguang;ChengSong;SunYoumei;Zh...
-
1Sheng Tao ZHANG,Zong Qing HUANG(Department of Applied Chemistry.Chongqing University. Chongqing 630044).EFFECT OF COBALT ION IMPLANTATION ON THE ELECTROCHEMISTRY OF NICKEL ELECTRODE[J].Chinese Chemical Letters,1994,5(11):979-982.
-
2Mei Fang Wu,Zhong Ning CHAN,Jun QIU and Wen Xia TANG(State Key Laboratory of Coordination Chemistry,Nanjing University. Nanjing 210008)Zhe Ming WANG,Shi Xiong LIU and Jin Ling HUANG(Center Laboratory, Fuzhou University, Fuzhou 350002).SYNTHESIS AND STRUCTURE OF A 2D SHEET-LIKE COPPER(II) COMPLEX WITH BRIDGING PYRIDINE-4-CARBOXYLATE AND TRANS-OXAMIDATE LIGANDS[J].Chinese Chemical Letters,1994,5(8):711-712.
-
3STUDIES OF THE LATTICE DAMAGE CAUSED BY ION IMPLANTATION INTO Al_xGa_(1-x_AS/GaAs[J].Chinese Chemical Letters,1994,5(8):707-710.
-
4Wang Tieshan,Jin Geneing,Hao Jifang,Zhang Baoguo,Piao Yubo,Wang Xuezhi and Niu Zhanqi.Anomalous Phenomena in E<18keV Ion Beam Implantation Experiments on Pd and Ti[J].IMP & HIRFL Annual Report,1995(0):187-188.
-
5郑德山,孙思修.层状杂化材料M_2(OH)_(4-x)(C_(10)H_(17)O_2)_x·zH_2O中有机官能团与无机金属的配位模式[J].山东大学学报(理学版),2012,47(1):23-27.
-
6Pang Lilong Wang Zhiguang Yao Cunfeng Sun Jianrong Cui Minghua Wei Kongfang Shen Tielong Sheng Yanbin Zhu Yabin Li Yuanfei Chang Hailong Wang J i Zhu Huiping.3 - 12 Damage Production in LiTaO3 Crystal Induced by H- and He-ions Implantation[J].IMP & HIRFL Annual Report,2012(1):99-100.
-
7HU Jinbo,HUANG Qingquan,LI Qilong.Electrochemical behavior of adriamycin at a cobalt ion implantation modified elec-trode[J].Chinese Science Bulletin,2001,46(16):1355-1357.
-
8Cun Zhong ZHANG,Jing YANG,Xiao Lin LU,Zhong Da WU( Department of Chemistry, Beijing Normal University, Beijing 100875).Preparation of Platinum Implanted Glassy Carbon Electrode and Electro-oxidation of Formic Acid and Formaldehyde[J].Chinese Chemical Letters,2000,11(1):71-74.
-
9Jing Bo HU,Qi Long LI(Department of Chemistry, Beijing Normal University, Bejing 100875).Electrochemical Behavior of Adriamycin at Ni/GC Ion Implantation Modified Electrode[J].Chinese Chemical Letters,2000,11(7):601-602.
-
10张敬来,汪欣,李亚.CH_3CCl_2与NO_2反应机理的理论研究[J].河南师范大学学报(自然科学版),2016,44(1):74-78.