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Investigation of EL2 Defect in 10 MeV Electron Irradiated Undoped Semi-insulating LEC GaAs

Investigation of EL2 Defect in 10 MeV Electron Irradiated UndopedSemi insulating LEC GaAs
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摘要 The induces defects and especially the EL2 defect in 10 MeV electron irradiated undoped semi-insulating(SI) LEC GaAs samples were investigated by using optical transient current spectroscopy (OTCS)technique.The results indicate that the density of EL2 defect of irradiated GaAs decreases and the density of EL6 defect in-creases at lower fluence levels. At higher fluences, we observe an increase in density of the EL2 level, howev-er,the density of the EL6 is decreased. It is suggested that on lower fluences, 10 MeV electron irradiation causes the dissociation of the EL2 defect, and may be used to decrease the main donor level EL2 in SI-GaAs. The induces defects and especially the EL2 defect in 10 MeV electron irradiated undoped semi-insulating(SI) LEC GaAs samples were investigated by using optical transient current spectroscopy (OTCS)technique.The results indicate that the density of EL2 defect of irradiated GaAs decreases and the density of EL6 defect in-creases at lower fluence levels. At higher fluences, we observe an increase in density of the EL2 level, howev-er,the density of the EL6 is decreased. It is suggested that on lower fluences, 10 MeV electron irradiation causes the dissociation of the EL2 defect, and may be used to decrease the main donor level EL2 in SI-GaAs.
出处 《Rare Metals》 SCIE EI CAS CSCD 1995年第4期249-252,共4页 稀有金属(英文版)
关键词 Undoped SI-GaAs EL2 OTCS technique 10 MeV electron irra-diation Undoped SI-GaAs, EL2,OTCS technique,10 MeV electron irra-diation
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