<100> Textured Diamond Film on Silicon Grown by Hot Filament Chemical Vapor Deposition

<100> Textured Diamond Film on Silicon Grown by Hot Filament Chemical Vapor Deposition

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摘要 The <100> textured growth of diamond film on HF eroded silicon wafer has been studied by HFCVD. The evolution of grain size and sudece morphology vs deposition time is presented and the <100> textured thick diamond film (80μm) with smooth surface, desirable for practical application in many fields is obtained The <100> textured growth of diamond film on HF eroded silicon wafer has been studied by HFCVD. The evolution of grain size and sudece morphology vs deposition time is presented and the <100> textured thick diamond film (80μm) with smooth surface, desirable for practical application in many fields is obtained

作者 Xuanxiong ZHANG Tiansheng SHI and Xikang ZHANG (State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy,Chinese Academy of Sciences, Shanghai, 200050, China)

出处《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1995年第6期426-428,共3页 材料科学技术（英文版）

关键词 Textured Diamond Film on Silicon Grown by Hot Filament Chemical Vapor Deposition OO

分类号 O78 [理学—晶体学]

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Journal of Materials Science & Technology

1995年第6期

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<100> Textured Diamond Film on Silicon Grown by Hot Filament Chemical Vapor Deposition

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