摘要
hin films of ZnO were prepared using the double photobeams ultraviolet laserinduced-metallorganic chemical vapour deposition (MOCVD)technique. The struc-ture and transparent photoconductive properties of these films were investigated us-ing X-ray diffraction (XRD) , reflecting electron diffraction (RED) .scanning elec-tron microscopy (SEM) and ultraviolet visible absorption spectrometry (UV) .Theexperiments showed that the technique produced superior quality films of polycrys-tal ZnO_(1-x) (the O-vacancies in the ZnO lattice) , and possessed higher depositionrate, lower growth temperature conipared with CVD or MOCVD technique and thethin films had far better transparent photoconductive properties than tliose grownby the conventional CVD or MOCVD technique.
hin films of ZnO were prepared using the double photobeams ultraviolet laserinduced-metallorganic chemical vapour deposition (MOCVD)technique. The struc-ture and transparent photoconductive properties of these films were investigated us-ing X-ray diffraction (XRD) , reflecting electron diffraction (RED) .scanning elec-tron microscopy (SEM) and ultraviolet visible absorption spectrometry (UV) .Theexperiments showed that the technique produced superior quality films of polycrys-tal ZnO_(1-x) (the O-vacancies in the ZnO lattice) , and possessed higher depositionrate, lower growth temperature conipared with CVD or MOCVD technique and thethin films had far better transparent photoconductive properties than tliose grownby the conventional CVD or MOCVD technique.
