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Growth Kinetic Studies for MOCVD CdTe and HgCdTe Epilayers on GaAs Substrates

Growth Kinetic Studies for MOCVD CdTe and HgCdTe Epilayers on GaAs Substrates
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摘要 The growth rates of CdTe and CMT on GaAs and on CdTe/GaAs substrates were studied as a function of temperature and gas composition. A Langmuir-Hinshelwood Model for surface reaction control region is suggested. The CdTe/GaAs interface was examined by X-ray double crystal diffraction, laser Raman spectroscopy and transmission electron microscopy (TEM). A defect layer was observed at CdTe/GaAs interface. The relationship between interface qualities and electrical properties of CMT overlayers was discussed. The growth rates of CdTe and CMT on GaAs and on CdTe/GaAs substrates were studied as a function of temperature and gas composition. A Langmuir-Hinshelwood Model for surface reaction control region is suggested. The CdTe/GaAs interface was examined by X-ray double crystal diffraction, laser Raman spectroscopy and transmission electron microscopy (TEM). A defect layer was observed at CdTe/GaAs interface. The relationship between interface qualities and electrical properties of CMT overlayers was discussed.
出处 《Rare Metals》 SCIE EI CAS CSCD 1992年第1期13-19,共7页 稀有金属(英文版)
关键词 Chemical Reactions Reaction Kinetics Gallium Compounds SUBSTRATES Kinetics Microscopic Examination Transmission Electron Microscopy Spectroscopy Raman Chemical Reactions Reaction Kinetics Gallium Compounds Substrates Kinetics Microscopic Examination Transmission Electron Microscopy Spectroscopy, Raman
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