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STUDY OF F^--ISFET

STUDY OF F^--ISFET
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摘要 The fluorine ion sensitive field-effect transistor(F<sup>-</sup>-ISFET)is made by depositingvery thin LaF<sub>3</sub> film on grid of field-effect transistor with sputter method.The operating principle,measuring method and measured results of F<sup>-</sup>-ISFET are given.The measured results show thatthis kind of sensor has higher sensitivity,shorter response time and better linearity.On the basisof experimental results,the factor of influencing the steadiness and repeatability of F<sup>-</sup>-ISFETare conjectured. The fluorine ion sensitive field-effect transistor(F^--ISFET)is made by depositing very thin LaF_3 film on grid of field-effect transistor with sputter method.The operating principle, measuring method and measured results of F^--ISFET are given.The measured results show that this kind of sensor has higher sensitivity,shorter response time and better linearity.On the basis of experimental results,the factor of influencing the steadiness and repeatability of F^--ISFET are conjectured.
作者 何杏君
机构地区 Nankai University
出处 《Journal of Electronics(China)》 1992年第1期83-87,共5页 电子科学学刊(英文版)
关键词 FIELD-EFFECT transistor(FET) FLUORINE ion sensitive-FET Insulated gate-FET Field-effect transistor(FET) Fluorine ion sensitive-FET Insulated gate-FET
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