摘要
Ⅰ. INTRODUCTIONMass interference is a chemicophysics phenomenon often generated in ion probe analysis. When measuring the concentration distribution of impurities implanted in Si, the mass interference produced by mass interference ions with the nearly same ratio of mass to charge (m/e) as the ions to be measured usually results in serious measurement errors. The above two kinds of ions cannot be segregated from each other because the mass resolution of mean ion probe is not high enough. In the case of eliminating edge effect ions
基金
Project supported by the National Natural Science Foundation of China.
