脉冲频率对锆薄膜表面形貌和结构的影响

Effect of Pulse Frequency on Surface Morphology and Microstructure of Zr Films Prepared by Pulse Laser Deposition

用脉冲激光气相沉积法在金属钼基底上制备锆薄膜,并用SEM,AFM,XRD等手段分析薄膜表面形貌和晶体结构,研究了脉冲激光频率对薄膜表面形貌和晶体结构的影响。结果表明:随着激光脉冲频率的提高锆薄膜表面液滴数目增加,液滴尺寸增大,薄膜的沉积速率显著降低。薄膜表面的平均纳米颗粒尺寸,随着频率的提高呈现先增大后减小的规律。从XRD数据发现,较高的脉冲频率极大地促进了薄膜的结晶性生长;但是,频率变化对Zr薄膜晶体结构、晶面择优生长的影响并不明显,薄膜呈现典型的hcp结构且不随频率的变化改变。

Zr films have been successfully deposited on Mo substrate by pulsed laser deposition(PLD).The microstructure and morphology of the as-deposited films were examined by grazing-incidence X-ray diffraction(GIXRD), scanning electron microscopy(SEM) and atomic force microscopy(AFM). The results show that the dimension and density of droplets increase with increasing pulse frequency. In the range of 6 to 20 Hz, the average deposition rate decreases with increasing pulse frequency. Under the same conditions, the average nanoparticle sizes of Zr films deposited on Mo increase and then decreases with increasing pulse frequency. Through XRD analysis, it follows that the higher pulse frequency is beneficial to the higher degree of crystallinity of Zr films. However, the pulse frequency has no significant effect on the preferential orientation of crystal planes of the deposited films.