316L不锈钢直流磁控溅射制备铝膜的工艺研究

Aluminum thin film deposited on 316L stainless steel by DC magnetron sputtering

采用直流磁控溅射在316L不锈钢上制备了高质量的Al膜,并利用扫描电镜、X射线衍射仪分别对镀层的形貌和结构及应力进行了分析。结果表明,温度、溅射功率之间的合理配置才能制备致密性高、表面缺陷少的Al膜,较优工艺参数温度为170℃、溅射功率1400 W;温度比溅射功率更容易改善结晶度,当溅射功率高、基体温度低,薄膜趋向非晶态;制备的薄膜应力小,最大约为0.176 GPa,微结构对应力影响大。

The high quality Al thin films were successfully deposited with DC magnetron sputtering process on 316L stainless steel.The surface morphologies, residual stress and microstructure of the aluminum films were characterized by scanning electron microscopy and X-ray diffraction respectively.The results show that a high density, less surface defects of the Al film can be obtained at reasonable arrangements of substrate temperature and sputtering power, and 170 ℃and 1400 W are the optimized technological parameters.Temperature affects the film crystallinity more than sputtering power, and the films transform into amorphous with high sputtering power and lower substrate temperature. The residual stress of the film is small and the maximum is about 0.176 GPa, meanwhile the microstructure has a greater impact on the stress.