摘要
利用中频交流反应磁控溅射方法制备TiO2 薄膜光催化剂 ,研究了溅射工艺参数对薄膜光催化能力的影响。采用动态反应系统 ,紫外光源为TUV ,降解对象为 0 0 2mmol/L亚甲基蓝溶液。结果发现 :Ar/O2 混合反应溅射在O2 分压大于 9%之后亦可制备出光催化能力与纯O2 溅射相近的TiO2 薄膜。TiO2 薄膜厚度是影响其光催化降解能力的最敏感因素 ,80 0nm以下TiO2 薄膜降解能力基本与厚度成正比。TiO2 薄膜在黑暗环境下长期放置 ,光催化性能会出现一定下降 。
Influence of various growth parameters of TiO 2 films grown by mid frequency,reactive magnetron sputtering on photo catalytic degradation was evaluated in the case of 0.02 mmol/L aqueous methylene blue solution.The results show that under the irradiation of UV light in a dynamic system,the photo catalytic degradation of the film grown at an oxygen partial pressure higher than 9% in the Ar/O 2 sputtering gaseous mixture is almost as good as that sputtered in pure oxygen.The photo catalytic degradation is very sensitive to the film thickness,basically being proportional to film thickness when its thickness is less than 800 nm.Observable photo catalytic property deterioration of the film after long time preservation in the dark may be effectively cured by pre irradiation of UV light.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2004年第2期87-91,104,共6页
Chinese Journal of Vacuum Science and Technology
基金
清华大学"985"基础研究基金资助项目