摘要
为了在光刻机工作过程中保证投影物镜的成像质量,人们开发了一系列投影物镜像差的现场测量技术。对目前国际上常用的几种高精度投影物镜像差现场测量技术进行了分析和比较。
In order to control the image quality of the projection lens, a number of in-situ measurement methods of lens aberrations have been developed. Several in-situ high-accuracy measurement methods of lens aberrations are analyzed and compared.
出处
《激光与光电子学进展》
CSCD
2004年第6期33-37,共5页
Laser & Optoelectronics Progress
关键词
光刻机
投影物镜
成像质量
像差
现场测量
photolithography aberrations projection lens image quality Zernike coefficients
