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Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP 被引量：1

Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
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摘要 We have been developing debris-free laser plasma sources for EUV lithography since 1996. Two types of debris-free sources, such as cryogenic target and gas-puff target laser plasma sources, were designed and built up in CIOMP. EUV radiation spectra of the sources with a variety of targets have been obtained by different ways. We have been developing debris-free laser plasma sources for EUV lithography since 1996. Two types of debris-free sources, such as cryogenic target and gas-puff target laser plasma sources, were designed and built up in CIOMP. EUV radiation spectra of the sources with a variety of targets have been obtained by different ways.
作者 CHEN Bo, NI Qi liang,CAO Jian lin (State Key Laboratory of Applied Optics,Changchun Institute of Optics, Fine Mechanics and Physics,Chinese Academy of Sciences, Changchun 130022, China)
出处 《光学精密工程》 EI CAS CSCD 2001年第5期442-445,共4页 Optics and Precision Engineering
关键词 EUV LITHOGRAPHY laser plasma DEBRIS - free CRYOGENIC TARGET gas - PUFF TARGET EUV lithography laser plasma debris-free cryogenic target gas-puff target
分类号 TN305.7 [电子电信—物理电子学]
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  • 1Malmqvist L, Rymell L, Berglund M, et al. Liquid-jet targetfor laser-plasma soft X-ray generation[J]. Rev. Sci. Instrum, 1996,67(12)： 4150-4153.
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  • 4Berglund M, Rymell L, Herts H M.Ultraviolet prepulse for enhanced X-ray emissionand brightness from droplet-target laser plasma[J].Appl. Phys. Lett, 1996,69(12):16.
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光学精密工程
2001年 第5期

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