热致晶化高反射率SbO_x薄膜的结构分析和光学性质

Structure Analysis and Optical Properties of Heat-Induced Crystalline High Reflection SbO_x Films

利用直流磁控反应溅射法制备了SbOx 薄膜 ,利用X射线衍射分析仪和光谱仪分别研究了这种薄膜热致晶化的微观结构和光学性质的变化 ,并通过非晶态薄膜粉末的示差扫描量热实验测出不同加热速度条件下结晶峰温度 ,研究了这种薄膜的结晶动力学。发现沉积态SbOx 薄膜为非晶态 ,非晶态SbOx 薄膜在热致晶化过程中发生了两种变化 ,分别对应为较低温度下Sb晶体和较高温度下立方Sb2 O3 相的生成。退火后晶态薄膜中出现了单质Sb和Sb2 O3 ,30 0℃退火后Sb2 O3 相含量最大。晶态薄膜的反射率均高于沉积态 ,在晶态薄膜中 2 0 0℃退火的薄膜反射率最大。

SbO x thin films were prepared by the method of reactive dc magnetron sputtering; the optical properties and structural changes of the films were studied by using X ray diffraction analysis and spectrometer respectively. By using the differential scanning calorimeter data of the amorphous film powder, measuring the peak temperature of crystallization at different heating rates, the crystallization kinetics of the thin films were studied.The results indicated that the as deposited films were amorphous and there were two stages during the heat induced crystallization. The first stage was the nanocrystallization of a primary phase antimony; the second stage was related to the formation of cubic Sb 2O 3 phase at higher temperatures. The Sb and Sb 2O 3 existed in crystalline films after annealed and there were much more Sb 2O 3 in 300 ℃ annealed films. The reflectivity of crystalline films was higher than that of the as deposited films. The reflectivity of 200 ℃ annealed film was the highest in all crystalline films.