摘要
Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main problem of nonuniform ion implantation on the target in PSII is dis-cussed by analyzing some calculated results. In addition, based on the relative researches in our laboratory, some cal-culated results of the ion sheath dynamics in PSII for inner surface modification of a cylindrical bore are presented. Fi-nally, new ideas and tendency for future researches on ion sheath dynamics in PSII are proposed.
Progress of the theoretical studies on the ion sheath dynamics in plasma source ion implantation (PSII) is reviewed in this paper. Several models for simulating the ion sheath dynamics in PSII are provided. The main problem of nonuniform ion implantation on the target in PSII is dis-cussed by analyzing some calculated results. In addition, based on the relative researches in our laboratory, some cal-culated results of the ion sheath dynamics in PSII for inner surface modification of a cylindrical bore are presented. Fi-nally, new ideas and tendency for future researches on ion sheath dynamics in PSII are proposed.
关键词
等离子鞘模拟
内表面等离子源离子注入
液体模型
粒子模拟
PSII
表面改性
plasma sheath simulation, plasma source ion implanta-tion, fluid model, particle simulation, inner surface plasma source ion implantation.
