摘要
讨论了在硅基片上旋涂用于光波导的PS聚合物薄膜时 ,部分工艺参数 ,如溶液浓度、旋涂转速、溶剂挥发性、吸水性等对薄膜质量的影响 ,得到了薄膜厚度随浓度和转速变化的经验公式。分析了造成薄膜缺陷的原因 ,并对薄膜的性能如薄膜厚度、红外吸收特性和表面轮廓进行了测试。
The effect of some process parameters,such as solution concentration,spin speed,volatility and vapor absorbing ability of solvents,on the qualities of the spin coated polymer thin films on silicon substrate is discussed.An experiential equations was summarized to describe the relationship between the thickness of the PS films and the solution concentration and spin speed.Possible conditions that may lead to fault on films are analyzed,and some characters of the film such as the thickness,infra-red absorbing spectrum and topography are tested.
出处
《激光技术》
CAS
CSCD
北大核心
2004年第3期315-318,共4页
Laser Technology
基金
国家八六三计划资助项目 (2 0 0 1AA312 170 )
关键词
光波导
薄膜
旋涂
聚合物
waveguide
thin film
spin coating
polymer
