脉冲激光制备薄膜材料的烧蚀机理

Target ablation characteristics during pulsed laser deposition of thin films

研究了脉冲激光烧蚀靶材的整个过程 .从包含热源项的导热方程出发 ,利用适当的动态边界条件 ,详细研究了靶材在熔融前后的温度分布规律 ,并且给出了熔融后的固、液分界面的变化规律 .熔融后的温度演化规律和固液相界面均以解析表达式的形式给出 .还根据能量平衡原理给出烧蚀面位置随时间的变化规律 .以硅靶材为例计算模拟了激光烧蚀的整个过程 ,与实验结果符合较好 .

The whole ablation process of target heated by pulsed lasers is studied in this paper. Under the appropriate dynamic boundary conditions, have been investigated in detail the heat flow equation with heat generation term, and the temperature distribution of target before and after the melting. In particular, after target melting, the temperature distribution and the interface position between the solid and liquid phases as functions of time are presented in the solution of analytical expressions. Additionally, under the energy balance conditions, the dependence of the ablating surface position on the time is investigated. Consequently, the ablation of target Si has been calculated. This research shows a positive result compared with the relevant experiments.