摘要
介绍了集成电路虚拟工厂系统TaurusWorkbench。并基于CMOS工艺的特点,在TaurusWorkbench环境下进行了亚微米级n沟器件的核心参数优化实验研究,结果印证了集成电路虚拟工厂技术为工艺优化提供了便捷有效的方法。
The paper introduces integrated simulation system the'virtual factory' Taurus Workbench.Based on process characteristics of CMOS,experiment for optimization of key core parameters for submicron n-channel MOS devices on the Taurus Workbench is discussed.Results from the experiment show that the new process conditions help to improve the device performance.
出处
《河北理工学院学报》
2004年第3期53-56,70,共5页
Journal of Hebei Institute of Technology