脉冲紫外激光刻蚀聚合物薄膜的发射光谱和形貌学研究

ULTRAVIOLET LASER ABLATION AND ETCHING POLYMER FILM

用聚焦的紫外XeCl准分子激光器轰击高分子聚合物薄膜(涤纶薄膜),由OMA系统接收其发射光谱.发现谱线主要为C_2的Swan带和CN的红带,并与高压汞灯照射后的聚合物薄膜的发射谱进行了比较,在我们的实验精度内,没有发现区别.实验显示,每个光脉冲能刻蚀掉几分之一到几个微米的薄膜.激光的刻蚀效应存在波长和能量密度两个阈值.对于涤纶薄膜,能量密度的阈值约为40mJ/cm^2.同时还作了紫外吸收光谱和SEM照片的分析.

Emission spectra have been studied for the polymer film(PET)expo-sed to 308nm pulsed excimer laser. The emission spectra of the polymer films which have been irradiated by UV lamp are also studied. These two kinds of spectra show no difference in our experiments. It is found that the spectra belong to C2 swan systerm and CN red system. Our experiments show that the etching depth of each pulse is about 1μm when the laser intensity is 300mJ/cm2, and the threshold of etching is 50mJ/cm2.SEM photos of the irradiated surface are also given.