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双光子三维微细加工的分辨率研究 被引量:6

Analysis on the Resolution of Two-photon Three-dimensional Microfabrication
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摘要 为了改善双光子加工的成型精度和微器件的质量,提高加工系统的分辨率是十分重要的。根据自由基类光聚合材料双光子加工分辨率的理论分析,提出等光强面概念,并在此基础上讨论了激发光强与系统加工分辨率之间的关系。通过不同光强条件下双光子三维加工固化单元的实验,验证了等光强面和系统分辨率之间的对应关系,并分析了出现微小差异的原因。根据上述理论模型,可以估算一定实验条件下系统可实现的加工分辨率,优化加工工艺参数。最后给出了部分微器件的成型结果。 To improve the molding accuracy of two-photon three-dimensional microfabrication and qualities of microstructures,upgrading the resolution power of fabrication system is very important.According to the theoretical analysis on two-photon microfabrication of free-radical photopolymer,the relationship between excitation power and resolution of fabrication system is discussed based on the concept of isocandela diagram.Through comparison of experiments results of three-dimensional solidified cells,the corresponding expression between the isocandela diagram and the resolution of fabrication system is verified and the difference between them is analyzed at the same time.Thus,with the help of the theoretical mode,the resolution of two-photon microfabrication system and the optimized process parameters can be estimated under certain experimental conditions.Finally,some examples of the microdevices fabricated with complex structure are given.
出处 《微细加工技术》 2004年第2期31-36,共6页 Microfabrication Technology
基金 国家自然科学基金资助项目(50275140) 国家863基金资助项目(MEMS2003AA404-03)
关键词 等光强面 双光子激发 三维微细加工 isocandela diagram two-photon excitation three-dimensional microfabrication
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参考文献6

  • 1Satoshi Kawata,Hong-Bo Sun,Tomokazu Tanaka,et al.Finer features for functional micro devices[J].Nature,2001,412:697-698.
  • 2蒋中伟,袁大军,祝安定,夏安东,黄文浩,褚家如,刘允萍.双光子三维微细加工技术及实验系统的开发[J].光学精密工程,2003,11(3):234-238. 被引量:22
  • 3B H Cumpston,S P Ananthavel,S Barlow,et al.Two-photon polymerization imitators for three-dimensional optical data storage and microfabrication[J]. Nature,1999,398:51-54.
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  • 5Hong-Bo Sun,Takeshi Kawakami,Ying Xu,et al.Real three-dimensional microstructures fabricated by photopolymerization of resins through two-photon absorption[J].Opt Lett,2000,25(10):1110-1112.
  • 6Jose Ramon Salgueiro,Vicente Moreno,Jesus Linares.Model of linewidth for laser writing on photoresist[J].Applied Optics,2002,41(5):895-901.

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