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AlGaN/GaN异质结极化行为与二维电子气 被引量:2

The polarization and 2DEG in AlGaN/GaN heterostructures
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摘要 AlGaN/GaN异质结及其相关器件因其优越的电学特性成为近几年的研究热点。2DEG作为其特征与材料本身的极化现象关系密切。本文主要从晶体微观结构角度介绍AlGaN/GaN异质结极化现象的产生、机理和方向性,着重讨论极化对异质结界面处诱生的二维电子气的影响。极化不仅可提高2DEG的浓度,而且还能使其迁移率得到提高。 AlGaN/GaN heterostructure has many characteristics which make it potential forelectronic devices that can be operated under conditions of high voltage, high frequency and hightemperature. 2DEG and polarization phenomena are the most important features of these devices.Based on the crystal structure, the mechanism and direction of polarization is presented. In addition,the characteristics of the 2DEG induced by polarization are reviewed. It is also pointed out thatpolarization can not only increase the concentration of 2DEG, but also improve the electron mobility.
出处 《半导体技术》 CAS CSCD 北大核心 2004年第7期63-65,56,共4页 Semiconductor Technology
关键词 AIGAN/GAN 异质结 极化 二维电子气 2DEG heterostucture polarization 2DEG
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  • 1(美)施敏 王阳元等(译).半导体器件物理与工艺(第一版)[M].北京:科学出版社,1993,3..
  • 2[1]Khan M A, Bhattarai A, Kuznia J N, et al. High electron mobility transistor based on a GaN/AlGaN heterojunction [J]. Appl. Phys. Lett., 1993, 63:1214-1216.
  • 3[2]Chen Q, Yang J W, Gaska R, et al. High-power microwave 0.25-μm gate doped-channel GaN/AlGaN heterostructure field effect transistor [J]. IEEE Electron Device Lett., 1998, 19(2) :44-46.
  • 4[3]Mishra U K, Wu Y F, Keller B P, et al. GaN microwave electronics [J]. IEEE Tran. Microwave Theo. & Tech.,1998, 46(6) :756-761.
  • 5[4]Asbeck P M, Yu E T, Lau S S, et al. Piezoelectric charge densities in AlGaN/GaN HFETs [J]. Electron. Lett.,1997, 33:1230-1231.
  • 6[5]Yu E T, Sullivan G J, Asbeck P M, et al. Measurement of piezoelectrically induced charge in GaN/AlGaN heterostructure field-effect transistors [J]. Appl. Phys. Lett., 1997, 71:2794-2796.
  • 7[6]Maeda N, Nishida T, Kobayashi N, et al. Two-dimensional electron-gas density in AlxGa1- xN/GaN heterostructure field-effect transistors [J]. Appl. Phys. Lett., 1998, 73(13):1856-1858.
  • 8[7]Shen B, Someya T, Arakawa Y. Influence of strain relaxation of the AlxGa1-xN barrier on transport properties of the two-dimensional electron gas in modulation-doped AlxGa1- xN/GaN heterostructures [J]. Appl. Phys. Lett. , 2000, 76(19) :2746-2748.
  • 9[8]Bykhovshi A, Gelmont B, Shur M. The influence of the strain-induced electric field on the charge distribution in GaNAlN-GaN structures [J]. J. Appl. Phys., 1993, 74(11):6734-6739.
  • 10[9]Yoshida J, Classical versus quantum mechanical calculation of the electron distribution at the n-AlGaAs/GaAs heterointerface [J]. IEEE Trans. Electron Devices, 1986, Ed-33:154-156.

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  • 1孔月婵,郑有炓.Ⅲ族氮化物异质结构二维电子气研究进展[J].物理学进展,2006,26(2):127-145. 被引量:9
  • 2申晔,邢怀中,俞建国,吕斌,茅惠兵,王基庆.极化诱导的内建电场对Mnδ掺杂的GaN/AlGaN量子阱居里温度的调制[J].物理学报,2007,56(6):3453-3457. 被引量:1
  • 3AMBACHER O, FOUTZ B, SMART J, et al. Two dimension electron gases induced by spontaneous and piezoelectric in undoped and doped A1GaN/GaN heterostructure [ J ]. J Appl Phys,2000,87(1) : 334 - 344.
  • 4FABIO B, VINCENZO F. Spontaneous polarization and piezo electric constants of IlI-V nitrides [J]. Physical Review:B, 1997,56(16) : R10024 - R10027.
  • 5KHAN M A,SHUR S M,CHEN Q,et al. Hall measurements and contact resistance in doped GaN/AIGaN heterostrueture[J]. Appl Phys Lett, 1996,68 (21 ) : 3022 - 3024.
  • 6SMORCHKOVA I P, ELSASS C R, IBBETSON J P, et al. Polari zation-induced charge and electron mobility in AIGaN/GaN hereto structure grown by plasma-assisted moleculaPbeam epitaxy[J]. J Appl Phys,1999,86(8) : 4520- 4526.
  • 7YU E T. Spontaneous and piezoelectric polarization in nitride her terostructures[EB/OL]. ( 2002 - 04 - 03 ) [ 2010 - 05 - 28 ]. ht tp : / / poe. ucsd. edu/group/pdfpubs/GaNbkchap2, pdf .
  • 8孔月婵,郑有炓,储荣明,顾书林.Al_xGa_(1-x)N/GaN异质结构中Al组分对二维电子气性质的影响[J].物理学报,2003,52(7):1756-1760. 被引量:21

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