溅射法制备纳米薄膜材料及进展

Sputtering technology of nano thin films

溅射技术以其在制备薄膜中的独特优点,成为获得高性能纳米材料的重要手段。本文介绍了离子束溅射和磁控溅射技术的基本原理、方法及其在制备纳米材料中的应用和优点,以国内外这方面的最新进展。文章最后对我国纳米材料今后的应用及发展前景进行了展望。

On the basis of the summarization of nano film material preparation, two potentialtechnologies——ion beam sputter deposition and magnetron sputtering method are proposed.. Theprinciple, preparation methods, properties and applications of nano film materials have beensummarized. The development and application prospects of nano film materials and its preparationmethods are also estimated.